Room temperature operation of epitaxially grown Si/Si0.5Ge0.5/Si resonant interband tunneling diodes

نویسندگان

  • Sean L. Rommel
  • Thomas E. Dillon
  • M. W. Dashiell
  • H. Feng
  • Paul R. Berger
  • Karl D. Hobart
  • Roger Lake
  • Alan C. Seabaugh
  • Gerhard Klimeck
  • Daniel K. Blanks
چکیده

Related Articles Ultra-thin titanium oxide Appl. Phys. Lett. 101, 083113 (2012) Influence of doping on the electronic transport in GaSb/InAs(Sb) nanowire tunnel devices Appl. Phys. Lett. 101, 043508 (2012) Simulation of trap-assisted tunneling effect on characteristics of gallium nitride diodes J. Appl. Phys. 111, 123115 (2012) Tuning of terahertz intrinsic oscillations in asymmetric triple-barrier resonant tunneling diodes J. Appl. Phys. 111, 124310 (2012) Repeatable low-temperature negative-differential resistance from Al0.18Ga0.82N/GaN resonant tunneling diodes grown by molecular-beam epitaxy on free-standing GaN substrates Appl. Phys. Lett. 100, 252105 (2012)

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تاریخ انتشار 1998